· 通過(guò)視口、接地電極和驅(qū)動(dòng)電極進(jìn)行分析

·  高靈敏度 / 穩(wěn)定的脈沖離子計(jì)數(shù)檢測(cè)器，有7個(gè)數(shù)量級(jí)的動(dòng)態(tài)范圍
·  帶差式泵的三級(jí)過(guò)濾四極桿，質(zhì)量數(shù)范圍至2500amu

·  45°靜電扇區(qū)分析器，掃描能量增量 0.05 eV / 0.25eV FWHM

·  1000eV 選配,，漂浮電壓可選至10keV；Faraday 檢測(cè)器用于高密度等離子體
·  Mu-Metal，Radio-metal 屏蔽可選，高壓操作可選
·  信號(hào)選通分辨率0.1μs，用于研究脈沖等離子體或能量、質(zhì)量分布隨時(shí)間的變化
·  通過(guò)RS232、RS485或Ethernet LAN，控制軟件MASsoft

EQP Mass and Energy Plasma Analyser (3.3 MB)

EQP Poster A3 size (254 KB)

EQP Poster A1 size (2.53 MB)

Mass Spectrometers for Thin Films, Plasma and Surface Engineering (1.1 MB)

AP0280 Advantages of HIPIMS of Silver for Improved E. coli Inactivation (248 KB)

AP0319 High power impulse magnetron sputtering (HIPIMS) and traditional pulsed sputtering (DCMSP) Ag-surfaces leading to E. coli inactivation (233KB)

AP0322 Composition and Species Evolution in a Laser-induced LuMnO3 Plasma (381 KB)

AP0371 In-situ Monitoring of the Growth of Silver Thin Film – the Influence of Sputtering Gas (283 KB)

AP-EQP-0001 - Negative-ion Surface Production in Hydrogen Plasmas (286 KB)

AP-EQP-0002 - Highly selective etching of SiO2 over Si3N4 and Si in capacitively coupled plasma employing C5HF7 gas (658 KB)

Mass and Energy Spectra of Plasmas 50 ns Time Resolved Measurements

Atmospheric Plasma Analysis by Molecular Beam MS (1.38 MB)

Atmospheric Pressure Plasma Analysis ICPIG (256 KB)

Effects of Pulsing on the P-CFUBMS of CrAIN Coatings (3.6 MB)

Ion Energy Distributions for a DC Plasma (144 KB)

Mass Spectroscopy of Metastable Atomic Species in Gas Analysis and Processing Plasmas at High Spectrometer Source Pressures - AVS 2011 (1.6 MB)

Surface Analysis by Plasma Assisted Desorption Ionisation Mass Spectrometry (PADI-MS) (195 KB)

Energy/Mass Spectrometer Analyser and Langmuir Probe Diagnostics for HIPIMS (1.88 MB)

Plasma Diagnostics in High Power Impulse Magnetron Sputtering Discharges - TIRI JSFS 2012 Tokyo YAG (3.52 MB)

AmesTechnology Capabilities and Facilities | Plasma Diagnostics

Research featuring data from the Hiden Analytical EQP Mass and Energy Analyser for Plasma Diagnostics

PSI – Paul Scherrer Institut | Plasma & Thin Film Analysis

Plasma and Thin Film Analysis